Wikipedia

Hafnium(IV) oxide

Hafnium(IV) oxide
Hafnium(IV) oxide structure
Hafnium(IV) oxide structure
Hafnium(IV) oxide
Hafnium(IV) oxide
Names
IUPAC name
Hafnium(IV) oxide
Other names
Hafnium dioxide
Hafnia
Identifiers
3D model (JSmol)
ChemSpider
ECHA InfoCard 100.031.818 Edit this at Wikidata
EC Number
  • 235-013-2
UNII
  • InChI=1S/Hf.2O checkY
    Key: CJNBYAVZURUTKZ-UHFFFAOYSA-N checkY
  • InChI=1/Hf.2O/rHfO2/c2-1-3
    Key: CJNBYAVZURUTKZ-MSHMTBKAAI
  • O=[Hf]=O
Properties
HfO2
Molar mass 210.49 g/mol
Appearance off-white powder
Density 9.68 g/cm3, solid
Melting point 2,758 °C (4,996 °F; 3,031 K)
Boiling point 5,400 °C (9,750 °F; 5,670 K)
insoluble
−23.0·10−6 cm3/mol
Thermochemistry
–1117 kJ/mol[1]
Hazards
Flash point Non-flammable
Related compounds
Other cations
 Titanium(IV) oxide
Zirconium(IV) oxide
Related compounds
 Hafnium nitride
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
☒N verify (what is checkY☒N ?)

Hafnium(IV) oxide is the inorganic compound with the formula HfO
2. Also known as hafnium dioxide or hafnia, this colourless solid is one of the most common and stable compounds of hafnium. It is an electrical insulator with a band gap of 5.3~5.7 eV.[2] Hafnium dioxide is an intermediate in some processes that yield hafnium metal.

Hafnium(IV) oxide is quite inert. It reacts with strong acids such as concentrated sulfuric acid and with strong bases. It dissolves slowly in hydrofluoric acid to give fluorohafnate anions. At elevated temperatures, it reacts with chlorine in the presence of graphite or carbon tetrachloride to give hafnium tetrachloride.

Structure

[edit]

Hafnia typically adopts the same structure as zirconia (ZrO2). Unlike TiO2, which features six-coordinate Ti in all phases, zirconia and hafnia consist of seven-coordinate metal centres. A variety of other crystalline phases have been experimentally observed, including cubic fluorite (Fm3m), tetragonal (P42/nmc), monoclinic (P21/c) and orthorhombic (Pbca and Pnma).[3] It is also known that hafnia may adopt two other orthorhombic metastable phases (space group Pca21 and Pmn21) over a wide range of pressures and temperatures,[4] presumably being the sources of the ferroelectricity observed in thin films of hafnia.[5] A rhombohedral phase of hafnia also exists.[6][7]

Thin films of hafnium oxides deposited by atomic layer deposition are usually crystalline. Because semiconductor devices benefit from having amorphous films present, researchers have alloyed hafnium oxide with aluminum or silicon (forming hafnium silicates), which have a higher crystallization temperature than hafnium oxide.[8]

Applications

[edit]

Hafnia is used in optical coatings, and as a high-κ dielectric in DRAM capacitors and in advanced metal–oxide–semiconductor devices.[9] Hafnium-based oxides were introduced by Intel in 2007 as a replacement for silicon oxide as a gate insulator in field-effect transistors.[10] The advantage for transistors is its high dielectric constant: the dielectric constant of HfO2 is 4–6 times higher than that of SiO2, which is 3.9.[11] The dielectric constant and other properties depend on the deposition method, composition and microstructure of the material.

Research

[edit]

Hafnium oxide (as well as doped and oxygen-deficient hafnium oxide) attracts additional interest as a possible candidate for resistive-switching memories[12] and CMOS-compatible ferroelectric memories such as Ferroelectric field effect transistors (FeFET memory)[13], Ferroelectric Rams (FeRAM) and Ferroelectric tunnel junction (FTJ) [13] as well as memory chips.[14][15][16][17]

As silicon technology approached its scaling limit, ferroelectric hafnia is seen as one of the potential replacements for CMOS and beyond-CMOS devices for current and future electronics [18][19][20]. It has the potential to enhance the design of electronic devices and challenge the traditional von Neumann computing paradigm by enabling near-memory computing [21], which allows for higher speed and lower power consumption in energy-efficient non-volatile memories, neuromorphic devices [22][23], and AI applications [24][25]. Beyond computing, its ferroelectric, dielectric, and pyroelectric properties are also being studied for applications in sensors and other emerging technologies [25][26][27][1].

Because of its very high melting point, hafnia is also used as a refractory material in the insulation of such devices as thermocouples, where it can operate at temperatures up to 2500°C.[28]

Multilayered films of hafnium dioxide, silica, and other materials have been developed for use in passive cooling of buildings. The films reflect sunlight and radiate heat at wavelengths that pass through Earth's atmosphere, and can have temperatures several degrees cooler than surrounding materials under the same conditions.[29]

Challenges

[edit]

HfO₂-based ferroelectrics face several challenges across materials, devices, integration, and applications [22][30]. On the material side, difficulties include stabilizing the metastable orthorhombic phase and controlling oxygen vacancy concentration, while research opportunities focus on controlled doping strategies, superlattice engineering, strain/interface engineering, and exploring novel lead-free systems [31][32][33].

At the device level, issues such as wake-up and fatigue effects, endurance limits under full switching, scaling below 10 nm, and charge-trapping in FeFETs hinder reliability, but approaches like domain engineering, low-voltage partial switching, advanced 3D device architectures, and interface dielectrics offer promising solutions [31][30]. In terms of integration, BEOL compatibility, wafer-scale uniformity, interfacial degradation, and process variability remain major obstacles, yet ALD-based deposition, interface control for oxygen vacancy management, and stacked or multilayer designs for 3D memory integration are promising paths forward [18][34][35]. Finally, for applications, limitations include NVM endurance, thermal drift, and CIM-related static power and accuracy losses, but future opportunities lie in asymmetric programming, superlattice capacitors, cryogenic-optimized memory, ferroelectric CIM, FeCAP-based systems, and neuromorphic or reservoir computing architectures [22][35][36].

References

[edit]
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  2. ^ Bersch, Eric; et al. (2008). "Band offsets of ultrathin high-k oxide films with Si". Phys. Rev. B. 78 (8): 085114. Bibcode:2008PhRvB..78h5114B. doi:10.1103/PhysRevB.78.085114.
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